Carbide Targets

  • Boron Carbide (B4C) Sputtering Targets
    Advanced Engineering Materials (AEMProduct) is a leading manufacturer of high-purity, thin film deposition materials used in the semiconductor, data storage, LED, wireless, aerospace defense, photonics and life sciences markets. We deliver materials, matched in their quality parameters in an optimal
  • Chromium Carbide (CrC) Sputtering Targets
  • Hafnium Carbide (HfC) Sputtering Targets
    Hafnium carbide (HfC) is a chemical compound of hafnium and carbon. With a melting point of about 3900 C, it is one of the most refractory binary compounds known.However, it has a low oxidation resistance, with the oxidation starting at temperatures as low as 430 C . Hafnium carbide is usually carbo
  • Molybdenum Carbide (Mo2C) Sputtering Targets
    Molybdenum Carbide (MoC and Mo2C) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. Molybdenum Carbide should be an alternative catalyst with high efficiency for hydrogen production. Material Notes Molybdenum Carbide Sputtering Target, Purity is 99.5
  • Niobium Carbide (NbC) Sputtering Targets
    Niobium carbide (NbC and Nb2C) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. It is usually processed by sintering and is a frequent additive as grain growth inhibitor in cemented carbides. It has the appearance of a brown-gray metallic powder wit
  • Silicon Carbide (SiC) Sputtering Targets
    Silicon carbide (SiC), also known as carborundum, is a compound of silicon and carbon with chemical formula SiC. It occurs in nature as the extremely rare mineral moissanite. Synthetic silicon carbide powder has been mass-produced since 1893 for use as an abrasive. Grains of silicon carbide can be b
  • Tantalum Carbide (TaC) Sputtering Targets
    Tantalum carbides form a family of binary chemical compounds of tantalum and carbon with the empirical formula TaCx, where x usually varies between 0.4 and 1. They are extremely hard, brittle, refractory ceramic materials with metallic electrical conductivity. They appear as brown-gray powders, whic
  • Titanium Carbide (TiC) Sputtering Targets
    Titanium carbide, TiC, is an extremely hard (Mohs 99.5) refractory ceramic material, similar to tungsten carbide. It has the appearance of black powder with the sodium chloride (face-centered cubic) crystal structure. Titanium carbide is used in preparation of cermets, which are frequently used to m
  • Tungsten Carbide (WC) Sputtering Targets
    Tungsten carbide (chemical formula: WC) is a chemical compound (specifically, a carbide) containing equal parts of tungsten and carbon atoms. In its most basic form, tungsten carbide is a fine gray powder, but it can be pressed and formed into shapes for use in industrial machinery, cutting tools, a
  • Vanadium Carbide (VC) Sputtering Targets
    Vanadium carbide is the inorganic compound with the formula VC. It is an extremely hard refractory ceramic material. With a hardness of 9-9.5 Mohs, it is possibly the hardest metal-carbide known. It is of interest because it is prevalent in vanadium metal and alloys. Vanadium Carbide has an elastic
  • Zirconium Carbide (ZrC) Sputtering Targets
    Zirconium carbide (ZrC) is an extremely hard refractory ceramic material, commercially used in tool bits for cutting tools. It is usually processed by sintering. Zirconium carbide (ZrC) films were prepared by using two Ar+ beams to sputter a zirconium target and a graphite target separately, and a t
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