Indium (In)

  • Copper Indium (Cu/In) Sputtering Targets
    AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin
  • Copper Indium Gallium (CIG) Sputtering Targets
    Copper indium gallium (CIG) alloy sputtering targets, made from copper, indium and gallium, are used as an absorbing layer in CIGS thin film solar photovoltaic manufacturing. AEMProducts copper indium gallium sputtering targets have extremely uniform microstructure and composition control throughout
  • Copper Indium Gallium Selenide (CIGS) Sputtering Targets
    Photovoltaic (PV) cells are made from semiconductors of which two types, crystalline silicon and thin film, are currently the most popular. Crystalline silicon is the most common type in use due to their history of development and the large number of companies manufacturing various types of silicon
  • Copper Indium Selenide (CIS) Sputtering Targets
    Although amorphous silicon is the leading thin-film photovoltaic (PV) material research is underway with other promising materials. Materials like Copper Indium Diselenide (CuInSe2 or CIS). The current world record thin-film solar cell efficiency of 17.7% is held by a device based on copper indium d
  • IGZO (Indium Gallium Zinc Oxide) Sputtering Targets
    Indium Gallium Zinc Oxide (IGZO)is a semiconducting material, consisting of indium (In), gallium (Ga), zinc (Zn) and oxygen (O), High-mobility indium gallium zinc oxide (IGZO) thin-film transistors (TFTs) are achieved through low-temperature crystallization enabled via a reaction with a transition m
  • Indium (In) Evaporation Materials
    Indium is a post-transition metal with properties similar to gallium. It is soft and metallic-gray in color. It has a density of 7.3 g/cc, a melting point of 157 C , and a vapor pressure of 10-4 Torr at 742 C . One of its notable characteristics is its ability to cling to glass and other similar sur
  • Indium (In) Sputtering Targets
    ndium is a chemical element with symbol In and atomic number 49. It is a post-transition metal that makes up 0.21 parts per million of the Earths crust. Very soft and malleable, indium has a melting point higher than sodium and gallium, but lower than lithium and tin. Chemically, indium is similar to
  • Indium Antimony Sputtering Targets (In/Sb)
    Material Notes Indium Antimony Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing Hi
  • Indium Oxide (In2O3) Sputtering Targets
    Indium(III) oxide (In2O3) is a chemical compound, an amphoteric oxide of indium. Highly transparent and conductive In2O3ZnO films have been prepared by rf magnetron sputtering using targets composed of In2O3and ZnO. The etching rate of In2O3ZnO films when using HCl as the etchant could be controlled
  • Indium Selenide (In2Se3) Sputtering Targets
    Indium(III) selenide is a compound of indium and selenium. It has potential for use in photovoltaic devices and it has been the subject of extensive research. AEM specializes in producing high purity Indium(III) Selenide Sputtering Targets with the highest possible density and smallest possible aver