Silicon (Si)

  • Aluminum Silicon (Al/Si 90/10) Sputtering Targets
    AEMProduct can offer 99.999% purity Aluminum Silicon (AlSi 99/1, AlSi 95/5, AlSi 90/10, AlSi 88/12, AlSi 80/20, AlSi 75/25, AlSi 65/35, AlSi 50/50) Sputtering Targets and Evaporation Materials with high density and distinguished homogeneous microstructurs. Advanced Engineering Materials sputtering t
  • Aluminum Silicon Copper (Al/Si/Cu) Sputtering Targets
    High-purity AlSiCu sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.999%. Advanced Engineering Materials customized sputtering targets have been accepted in
  • Chromium Silicide (CrSi) Sputtering Targets
    AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin
  • Chromium Silicide (CrSi2) Sputtering Targets
    Silicides are the product of chemical reactions of metals with silicon. Transition metal silicides have attracted special attention for scientific study and industrial application due to their promising electrical and mechanical properties and their high thermal and chemical stability. Furthermore,
  • Magnesium Silicide (Mg2Si) Sputtering Targets
    Magnesium silicide, Mg2Si, is an inorganic compound consisting of magnesium and silicon. As a powder magnesium silicide is dark blue or slightly purple in color.Insoluble in water and denser than water . Contact may irritate skin, eyes and mucous membranes. May be toxic by ingestion. Material Notes
  • Molybdenum Silicide (MoSi2) Sputtering Targets
    Molybdenum disilicide (MoSi2, or molybdenum silicide), an intermetallic compound, a silicide of molybdenum, is a refractory ceramic with primary use in heating elements. It has moderate density, melting point 2030 C , and is electrically conductive. At high temperatures it forms a passivation layer
  • Nickel Chromium Aluminum Silicon Sputtering Targets (Ni/Cr/Al/Si (54-37-6-3 wt%))
    Material Notes of Nickel Chromium Aluminum Silicon Sputtering Targets Nickel Chromium Aluminum Silicon Sputtering Targets (Ni/Cr/Al/Si (54-37-6-3 wt%)), Purity is 99.9%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor
  • Silicon (Si) Evaporation Materials
    Silicon is one of the most extensively used elements in the world. It is dark gray and semi-metallic with a bluish tinge. It has a melting point of 1,410 C , a density of 2.32 g/cc, and a vapor pressure of 10-4 Torr at 1,337 C . It is a brittle metalloid which can chip easily. Silicon is a semicondu
  • Silicon (Si) Sputtering Targets
    Silicon is a solid at room temperature, with a melting point of 1,414 C (2,577 F) and a boiling point of 3,265 C (5,909 F). Like water, it has a greater density in a liquid state than in a solid state and it expands when it freezes, unlike most other substances. With a relatively high thermal conduc
  • Silicon Carbide (SiC) Sputtering Targets
    Silicon carbide (SiC), also known as carborundum, is a compound of silicon and carbon with chemical formula SiC. It occurs in nature as the extremely rare mineral moissanite. Synthetic silicon carbide powder has been mass-produced since 1893 for use as an abrasive. Grains of silicon carbide can be b