Boron (B)

  • Aluminum Boride (AlB2) Sputtering Targets
    AEM Product is a senior manufacturer for Antimony sputtering targets, we have rich experience to manufacture and sale high purity Antimony sputtering targets.
  • Boron (B) Sputtering Targets
    AEMProducts boron target density can only reach 60% of its theoretical density but with less porous. To meet cutting edge RD needs or large production requirements, AEMProduct offers a full range of product and service solutions for high-purity PVD sputtering targets or evaporation materials. We als
  • Boron Carbide (B4C) Evaporation Materials
    Boron carbide (chemical formula approximately B4C) is an extremely hard boroncarbon ceramic, and covalent material used in tank armor, bulletproof vests, engine sabotage powders, as well as numerous industrial applications. With a Vickers Hardness of 30 GPa, it is one of the hardest known materials,
  • Boron Carbide (B4C) Sputtering Targets
    Advanced Engineering Materials (AEMProduct) is a leading manufacturer of high-purity, thin film deposition materials used in the semiconductor, data storage, LED, wireless, aerospace defense, photonics and life sciences markets. We deliver materials, matched in their quality parameters in an optimal
  • Boron Nitride (BN) Sputtering Targets
    General Boron nitride is a heat- and chemically resistant refractory compound of boron and nitrogen with the chemical formula BN. It exists in various crystalline forms that are isoelectronic to a similarly structured carbon lattice. The hexagonal form corresponding to graphite is the most stable an
  • Cerium Boride (CeB6) Sputtering Targets
    Cerium hexaboride (CeB6, also called cerium boride, CeBix, CEBIX, and (incorrectly) CeB) is an inorganic chemical, a boride of cerium. It is a refractory ceramic material. It has low work function and one of the highest electron emissivity known, and is stable in vacuum. The principal use of cerium
  • Chromium (Cr) Sputtering Targets
    General Chromium is a chemical element with symbol Cr and atomic number 24. It is the first element in group 6. It is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. The name of the element is derived from the Greek word, m
  • Chromium Boride (CrB2) Sputtering Targets
    Chromium diborides are hard materials with excellent resistance to corrosion and good thermal conductivity. CrB2 is used in plasma technology and for high-performance electrodes in electron microscopes, metal matrix composites (MMCs), cutting tools and cermets for machining aluminum Available Produc
  • Chromium Diboride powder
    Introduction Chromium Cobalt Alloy is a metal alloy of cobalt and chromium. They are combined with chromium and molybdenum to increase the metals corrosion resistance. Cobalt-chrome has a very high specific strength and is commonly used in gas turbines, dental implants, and orthopedic implants. AEM
  • Cobalt Boride (Co3B) Sputtering Targets
    AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin