Boron (B) Sputtering Targets

InquiryData sheet

AEMProduct’s boron target density can only reach 60% of its theoretical density but with less porous.

To meet cutting edge R&D needs or large production requirements, AEMProduct offers a full range of product and service solutions for high-purity PVD sputtering targets or evaporation materials. We also have an experienced technical team developing innovative new products. AEMProduct offers a complete line of sputtering targets ranging from ceramics, metals, and elemental forms for use in R&D, pilot and full-scale production, with purities ranging from 99,9% to 99,9999% in any form and shape, including bonding and backing-plates for most types of sputtering systems. With our in-house forming and machining capability, we can manufacture one-piece targets up to 14″ diameter or 20″ square. We also produce sputtering targets with custom shapes and compositions.

Purity:99.50%
Part No:AEMST-B

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