Aluminum Boride (AlB2) Sputtering Targets

InquiryData sheet

Advanced Engineering Materials’ sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct provides Ceramic and Metal targets for use in Sputtering and Laser Ablation systems. We are producing high-quality sputtering targets made out of all kinds of materials ranging from precious metals, pure metals, alloys, ceramics, cermets, borides, oxides, carbides, nitrides, silicides and fluorides. High-purity sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.9999%.

Purity:99.50%