Aluminum Copper (Al/Cu) Sputtering Targets

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Advanced Engineering Materials’ sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct offers a complete line of sputtering targets ranging from ceramics, metals, and elemental forms for use in R&D, pilot and full-scale production, with purities ranging from 99,9% to 99,9999% in any form and shape, including bonding and backing-plates for most types of sputtering systems. We deliver rotatable, tubular sputtering targets up to 3,000 mm length, planar sputtering targets up to 4,000 mm length or circular sputtering targets with individual diameters up to 800 mm. Bonding service is offered on request for all kind of sputtering targets.

Purity:99.9% ~ 99.999%

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