Oxide Targets

  • Lead Zirconium Titanate (PZT) Sputtering Targets
    Applications Ferroelectric Gate Dielectric For CMOS Features High purity Custom Sizes Available Manufacturing Process Manufacturing - Cold pressed - Sintered, Elastomer bonded to backing plate Cleaning and final packaging, Cleaned for use in vacuum, Protection from environmental contaminants Protect
  • Lithium Cobalt Oxide (LiCoO2) Sputtering Targets
    Material Notes Lithium Cobalt Oxide Sputtering Targets, Purity is 99.99%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.
  • Lithium Niobate (LiNbO3) Sputtering Targets
    Material Notes Lithium Niobate Sputtering Targets, Purity is 99.99%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.
  • Lithium Phosphate (Li3PO4) Sputtering Targets
    Material Notes Lithium Phosphate Sputtering Targets, Purity is 99.99%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm.
  • Lutetium Oxide (Lu2O3) Sputtering Targets
    Lutetium Oxide,a white solid, is a cubic compound of lutetium sometimes used in the preparation of specialty glasses . It is also called lutecia. It is a lanthanide oxide, also known as a rare earth . Lutetium(III) oxide is an important raw material for laser crystals. [4] It also has specialized us
  • Magnesium Oxide (MgO) Sputtering Targets
    MgO is prized as a refractory material, i.e. a solid that is physically and chemically stable at high temperatures. It has two useful attributes: high thermal conductivity and low electrical conductivity. By far the largest consumer of magnesia worldwide is the refractory industry, which consumed abo
  • Manganese Oxide (MnO) Sputtering Targets
    Manganese(II) oxide is an inorganic compound with chemical formula MnO. It forms green crystals. The compound is produced on a large scale as a component of fertilizers and food additives. Like many monoxides, MnO adopts the rock salt structure, where cations and anions are both octahedrally coordina
  • Molybdenum (Mo) Sputtering Targets
    Molybdenum is a silvery-grey metal with a Mohs hardness of 5.5. It has a melting point of 2,623 C (4,753 F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points.[6] Weak oxidation of molybdenum starts at 300 C (572 F). It has one of th
  • Molybdenum Oxide (MoO3) Sputtering Targets
    olybdenum trioxide is chemical compound with the formula MoO3. This compound is produced on the largest scale of any molybdenum compound. It occurs as the rare mineral molybdite. Its chief application is as an oxidation catalyst and as a raw material for the production of molybdenum metal. The oxidat
  • Neodymium Oxide (Nd2O3) Sputtering Targets
    Neodymium(III) oxide or neodymium sesquioxide is the chemical compound composed of neodymium and oxygen with the formula Nd2O3. It forms very light grayish-blue hexagonal crystals. The rare earth mixture didymium, previously believed to be an element, partially consists of neodymium(III) oxide. Mater
  • Nickel Oxide (NiO) Sputtering Targets
    ickel(II) oxide is the chemical compound with the formula NiO. It is notable as being the only well-characterized oxide of nickel (although nickel(III) oxide, Ni2O3 and NiO2 have been claimed). The mineralogical form of NiO, bunsenite, is very rare. It is classified as a basic metal oxide. Several mi
  • Niobium Oxide (Nb2O5) Sputtering Targets
    Niobium pentoxide is the inorganic compound with the formula Nb2O5. It is a colourless insoluble solid that is fairly unreactive. It is the main precursor to all materials made of niobium, the dominant application being alloys, but other specialized applications include capacitors, lithium niobate,
  • Samarium Oxide (Sm2O3) Sputtering Targets
    Samarium Oxide thin films, obtained by pulsed laser deposition and by radio frequency assisted pulsed laser deposition. Three different substrate types were used: silicon, platinum covered silicon and titanium covered silicon. The influence of the deposition parameters (oxygen pressure and laser flu
  • Scandium Oxide (Sc2O3) Sputtering Targets
    Scandium Oxide, Sc 2 O 3 , or scandia, is a high melting rare earth oxide. It is used in the preparation of other scandium compounds as well as in high-temperature systems (for its resistance to heat and thermal shock ), electronic ceramics, and glass composition (as a helper material). Material Not
  • Silicon Dioxide (SiO2) Sputtering Targets
    Silicon dioxide, also known as silica (from the Latin silex), is an oxide of silicon with the chemical formula SiO2, most commonly found in nature as quartz and in various living organisms. In many parts of the world, silica is the major constituent of sand. Silica is one of the most complex and most
  • Silicon Monoxide (SiO) Sputtering Targets
    Silicon monoxide is the chemical compound with the formula SiO where silicon is present in the oxidation state +2. In the vapour phase it is a diatomic molecule. Material Notes Silicon Monoxide Sputtering Target, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, W
  • Strontium Ruthanate (SrRuO3) Sputtering Targets
    Strontium Ruthanate (SRO) is an oxide of strontium and rutheniumwith the chemical formulaSr 2 RuO 4 . S trontium ruthenate compounds were thought to be relatable to the high- T c superconductors: both kinds of material are highly two-dimensional, and the crystal structure of Sr 2 RuO 4 is almost ide
  • Strontium Titanate (SrTiO3) Sputtering Targets
    Strontium titanate is an oxide of strontium and titanium with the chemical formula SrTiO3. At room temperature, it is a centrosymmetric paraelectric material with a perovskite structure. At low temperatures it approaches a ferroelectric phase transition with a very large dielectric constant ~104 but
  • Strontium Zirconate (SrZrO3) Sputtering Targets
    Strontium Zirconate (Strontium Zirconium Oxide) is generally immediately available in most volumes. High purity, submicron and nanopowderforms may be considered. Material Notes Strontium Zirconate Sputtering Target, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch
  • Tantalum Oxide (Ta2O5) Sputtering Targets
    Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta2O5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta2O5 is an inert material with a high refractive index and low absorption (i.e. colourl
  •