Advanced Engineering Materials’ customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. AEMProduct provides high performance sputtering targets in a wide range of materials, including non-ferrous and precious metals, engineered specialty alloys, oxides, ceramics and specialty inorganic thin film PVD chemicals. We deliver rotatable, tubular sputtering targets up to 3,000 mm length, planar sputtering targets up to 4,000 mm length or circular sputtering targets with individual diameters up to 800 mm. Bonding service is offered on request for all kind of sputtering targets.
Purity:99.9% ~ 99.999%