Barium Zirconate (BaZrO3) Sputtering Targets

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Advanced Engineering Materials’ sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct manufactures sputtering targets for all sputtering systems in pure metals, alloys, and ceramic materials, optionally bonded to specially designed backing plates. With our in-house forming and machining capability, we can manufacture one-piece targets up to 14″ diameter or 20″ square. We also produce sputtering targets with custom shapes and compositions.

Purity:99.90%
Part No:AEMST-BaZrO3

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