Bismuth Oxide (Bi2O3) Sputtering Targets

InquiryData sheet

Advanced Engineering Materials’ customized target products made of high purity raw material powder with super fine grain size, together with the distinguished homogeneous microstructure to achieve desired characteristics of sputtering deposited thin film and the longer life for target. AEMProduct manufactures sputtering targets for all sputtering systems in pure metals, alloys, and ceramic materials, optionally bonded to specially designed backing plates. High-purity sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.9999%.

Purity:99.9% ~ 99.99%
Part No:AEMST-Bi2O3

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