Calcium Sulfide (CaS) Sputtering Targets

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Advanced Engineering Materials’ sputtering targets have been widely used in applications from ferromagnetic thin films, semiconducting films, photoconductive films, high index films in infrared filters, capacitor dielectric films, lubricant films, magnetic and memory elements. AEMProduct manufactures sputtering targets for all sputtering systems in pure metals, alloys, and ceramic materials, optionally bonded to specially designed backing plates. Depending on the required material targets can be manufactured from 1 inch up to 20 inches in diameter, rectangular targets are available from small to over 1000mm lengths in single or multi sections.

Purity:99.9% ~ 99.95%

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