Hafnium Nitride Sputtering Target, HfN Coating Material, Purity 99.5%

Hafnium Nitride (HfN) Sputtering Targets

Hafnium nitride (HfNx) coatings were prepared via very high rate reactive sputtering in an Ar=N2 atmosphere over a wide range of nitrogen concentrations. The color of the coatings varied from a pale yellow at low nitrogen levels to a rich golden yellow color at the higher nitrogen levels. AEM specializes in producing high purity Hafnium Nitride Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Material Notes

Hafnium Nitride Sputtering Target, Purity is 99.5%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. Bonding is recommended for these materials. Many materials have characteristics which are not amenable to sputtering, such as, brittleness and low thermal conductivity.This material may require special ramp up and ramp down procedures. This process may not be necessary with other materials. Targets that have a low thermal conductivity are susceptible to thermal shock.