Silicide Targets

  • Chromium Silicide (CrSi) Sputtering Targets
    AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin
  • Chromium Silicide (CrSi2) Sputtering Targets
    Silicides are the product of chemical reactions of metals with silicon. Transition metal silicides have attracted special attention for scientific study and industrial application due to their promising electrical and mechanical properties and their high thermal and chemical stability. Furthermore,
  • Magnesium Silicide (Mg2Si) Sputtering Targets
    Magnesium silicide, Mg2Si, is an inorganic compound consisting of magnesium and silicon. As a powder magnesium silicide is dark blue or slightly purple in color.Insoluble in water and denser than water . Contact may irritate skin, eyes and mucous membranes. May be toxic by ingestion. Material Notes
  • Molybdenum Silicide (MoSi2) Sputtering Targets
    Molybdenum disilicide (MoSi2, or molybdenum silicide), an intermetallic compound, a silicide of molybdenum, is a refractory ceramic with primary use in heating elements. It has moderate density, melting point 2030 C , and is electrically conductive. At high temperatures it forms a passivation layer
  • Tantalum Silicide (TaSi2) Sputtering Targets
    Tantalum pentoxide, also known as tantalum(V) oxide, is the inorganic compound with the formula Ta2O5. It is a white solid that is insoluble in all solvents but is attacked by strong bases and hydrofluoric acid. Ta2O5 is an inert material with a high refractive index and low absorption (i.e. colourl