Alloy Targets

As a excellent manufacturer and exporter of Barium sputtering targets, AEM Product aims of providing high quality Ba sputtering target for our customers.

AEM Deposition specializes in producing high purity Aluminum Neodymium (Al/Nd) Sputtering Targets with the highest possible density. High Purity (99.9%) Aluminum Neodymium Sputtering Targets with smallest possible average grain sizes can be used for semiconductor, chemical vapor deposition (CVD) and

AEMProducts Scandium Aluminum alloys developed for high and very high-strength extrusions, offering exceptionally high fatigue properties and the same positive manufacturing propensities. Advanced Engineering Materials customized sputtering targets have been accepted in a wide range of applications

AEMProduct can offer 99.999% purity Aluminum Silicon (AlSi 99/1, AlSi 95/5, AlSi 90/10, AlSi 88/12, AlSi 80/20, AlSi 75/25, AlSi 65/35, AlSi 50/50) Sputtering Targets and Evaporation Materials with high density and distinguished homogeneous microstructurs. Advanced Engineering Materials sputtering t

High-purity AlSiCu sputtering targets are available for all PVD systems. Available for round, rectangular, S-Gun, ConMag, Quantum, Delta, Ring and multi-tiled configurations in purities ranging from 99.9% to 99.999%. Advanced Engineering Materials customized sputtering targets have been accepted in

AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin

AEMProduct sputtering targets have been accepted in a wide range of applications from ferromagnetic thin films, high index films in infrared filters, semiconducting films, capacitor dielectric films, photoconductive films, lubricant films, magnetic and memory elements to name but a few. Manufacturin

Copper indium gallium (CIG) alloy sputtering targets, made from copper, indium and gallium, are used as an absorbing layer in CIGS thin film solar photovoltaic manufacturing. AEMProducts copper indium gallium sputtering targets have extremely uniform microstructure and composition control throughout

Photovoltaic (PV) cells are made from semiconductors of which two types, crystalline silicon and thin film, are currently the most popular. Crystalline silicon is the most common type in use due to their history of development and the large number of companies manufacturing various types of silicon

Material Notes Copper Silver Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High

Material Notes Copper Zinc Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High p

Material Notes Gold Copper Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High p

Gold Palladium Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. We also have high quality pure glod sputtering targets with 99.99-99.999% purity for sale. Applications Semiconductor Chemical vapor deposition (CV

Gold Tin (Au/Sn, or 80% gold, 20% tin by weight ) is a unique material. It is used in a variety of applications requiring a high reliability, high melting solder joint. This particular alloy of gold tin (Au/Sn) has a melting temperature of 280C, which is lower than the 350C transition temperature in

Material Notes Indium Antimony Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing Hi

Material Notes Iridium Manganese Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing

Iron Aluminum Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing High purity Grain re

Material Notes Neodymium Iron Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing Hig

Material Notes Nickel Aluminum Sputtering Targets, Purity is 99.9%;Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. Applications Semiconductor Chemical vapor deposition (CVD) Physical vapor deposition (PVD) display Features Competitive pricing Hi

Material Notes Nickel Chromium Sputtering Targets, Purity is 99.9%; Circular: Diameter = 14inch, Thickness = 1mm; Block: Length = 32inch, Width = 12inch, Thickness = 1mm. NOTE: Ferromagnetic materials require additional consideration when selecting configuration/ thickness. High strength magnets or